AINeutralarXiv – CS AI · 18h ago5/10
🧠
Failure-Aware Refinement of Vision-Language Model for Lithography Defect Detection
Researchers propose a two-stage vision-language framework using Qwen3-VL with LoRA fine-tuning to detect semiconductor lithography defects, then employ a refinement module trained on first-stage failures to improve accuracy beyond standard single-stage approaches.